products

HPHE/GAPS-SH-1834 CMP Slurries

Product appearance:
milky white.
Product application:
Suitable for chemical mechanical polishing of ceramic materials, fast removal rate, good surface effect, controllable abrasive particle size, easy to clean.

 

Packing:
Packed in 25L/200L/1000L polyethylene plastic barrel, transported and stored under the environment of 0~40℃.
Storage:
Avoid contact with eyes and skin during use. If you accidentally touch it, rinse it off with running water.

Description

item HPHE/GAPS-SH-1834
SilicaSiO2% 38-42
proportion20℃,g/cm³) 1.265-1.3
PH20℃) 10.0-11
Viscosity20℃,mm²/s ≤5
The average particle sizenm 120-140
Modified additives Have
Stable period (months) 6

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